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Product characteristics (AIN template)
Substrate: c-plane sapphire
Crystal Structure of AlN Epitaxial Layer: wurtzite
Diameter: 50.8 mm ± 0.25 mm (typical)
Thickness of Substrate: 430 μm ± 25 μm (typical)
Thickness of AlN Epitaxial Layer: 1 μm ± 0.3 μm (typical)
Surface: c-plane AlN, as grown effective area < 40 mmΦ (typical) no cracks by a visual inspection.
Backside: rough
FWHM of X-ray ω-scan rocking curve: < 150 arcsec for (0002) (typical)
Conductivity: insulating
Packing: packaged fluoroware container and vacuum-packed.
gan-on-si-hemt_fig_02.gif

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